Glancing Angle Deposition

  • Nanochrome I

    Nanochrome I is an R&D / Pilot Electron Beam Evaporator with a variety of possible configurations.

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  • Nanochrome II

    Nanochrome II is the ideal platform for high temperature PVD processes. The system can be configured for a wide variety of deposition sources.

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  • Nanochrome IV

    The Nanochrome IV PARMS system produces dielectric thin film layers with final reaction and film densification at the substrate surface using a high current.

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  • Nanoquest Pico

    The Intlvac Nanoquest Pico is the ultimate compact ion milling platform for research and development of thin film applications such as Data Storage, Spintronics and Semiconductors.

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  • Nanoquest I

    The Nanoquest I Ion Beam Etching system is an ideal and versatile platform for etching single wafer substrates up to 6".

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  • Nanoquest II

    Designed for clean room operation, the Nanoquest II keeps the etch module in the service area of the clean room.

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  • Nanoquest III

    The Nanoquest III Batch Ion Beam Etching System is one of the most economical and versatile production ion beam etch systems on the market.

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  • Diamond Like Carbon

    The DLC's unique design and processes allow for numerous consecutive coating runs before any maintenance is required to maximize your throughput.

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  • Pleiades Cluster System

    The Pleiades is a cluster system designed to combine multiple Nanoquest and Nanochrome chambers. It offers a large range of applications and the possibility to combine different deposition technologies within separate chambers.

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